[NanoIC topic] Pulsed Atomic Layer Etching for Next‑Generation Spintronic memory and Quantum Devices

Master internship - Leuven | About a week ago As spintronic devices such as z - spin Spin– O rbit T orque M agnetic R andom- A ccess M emory (SOT-MRAM) emerge as promising candidates for next generation embedded memory in high performance computing, etching of complex alloys including magnetic stacks become a critical process challenge. These devices require nanometer scale control of etch depth, profile, and materia…