Towards Quantitative AFM Nanomechanical Metrology for Advanced Semiconductor Patterning — imec | SciFind

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Administrative / Other🇧🇪 BelgiumNo deadline

imec

Towards Quantitative AFM Nanomechanical Metrology for Advanced Semiconductor Patterning

🇧🇪 Leuven

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Master internship, PhD internship - Leuven | About a week ago The continuous scaling of semiconductor technology is driving increasingly small feature dimensions and pitches, enabled by advanced patterning technologies such as high-NA EUV lithography. As critical dimensions (CDs) continue to shrink and material stacks become increasingly complex, the mechanical properties of photoresists, underlayers, and hard masks…

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Towards Quantitative AFM Nanomechanical Metrology for Advanced Semiconductor Patterning

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